| 摘要 |
PURPOSE:To enhance resolution of pattern by inputting irradiation position information of a wafer irradiated with an auto-focus beam to an input section thereby eliminating error from a focus value. CONSTITUTION:The stepper comprises an input section 1 of coordinates on a wafer being irradiated with a beam, an operating section 2 comprising a focus control operating circuit 2b performing operation under control of a stepper main CPU 2a, a section 3 for irradiating a beam based on an operation result, and a section 4 for detecting a reflected light beam. Coordinate on the wafer being irradiated with an auto-focus beam is then key inputted to the beam irradiation input section 1. According to the constitution, profile of the wafer is obtained and thereby a focus offset input value is obtained. |
