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发明名称
CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH05217976(A)
申请公布日期
1993.08.27
申请号
JP19910063165
申请日期
1991.03.27
申请人
HITACHI CABLE LTD
发明人
KOMATA CHIKAFUMI;OZAWA MAKOTO;ONISHI MASAYA
分类号
B08B3/04;H01L21/304
主分类号
B08B3/04
代理机构
代理人
主权项
地址
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