| 摘要 |
PURPOSE:To provide the production process for a substrate which can form sure patterns even in such a case of UV rays hardly arriving at a substrate through the photosensitive compsn. and does not require the use of a solvent in a developing stage and the photosensitive compsn. useful for this process. CONSTITUTION:The photosensitive compsn. 1 consists of a high-polymer compd. which is hardly soluble in water, a photopolymn. curing material which is volumetrically shrunk by UV rays, a sensitizer, and a filler. The photosensitive compsn. 1 of the substrate 2 is irradiated with the UV rays via a mask 3, by which a part 1a thereof are cured. The cured parts 1a shrink and the adhesion to the substrate 2 is decreased by residual stresses. Only the cured parts 1a are removed by applying water. The other parts are hardly soluble in the water and, therefore, remain on the substrate 2. |
