| 摘要 |
PURPOSE:To obtain the positive type composition superior in sensitivity and resolution, capable of forming a resist pattern high in heat resistance, wide in a focusable margin, and used especially favorably in the field of manufacture of semiconductor elements. CONSTITUTION:The positive type composition comprises a compound having a quinonediazido group and an alkali-soluble resin obtained by polycondensing a phenol mixture of 25-45 weight % m-cresol, 41-60 weight % p-cresol and 10-30 weight % 1,3-xylenol with a aldehyde mixture of formaldehyde and p- hydroxybenzaldehyde and o-hydroxybenzaldehyde. |
