发明名称 PREPARATION OF SEMICONDUCTOR LASER ELEMENT
摘要 PURPOSE:To minimize the stress in a double-hetero junction semiconductor laser element for restraining the deterioration of it by employing GaAlAs to form the active layer to constitute the element and specifying the mixed-crystal ratios of the active layer and the weir layers sandwiching said layer. CONSTITUTION:On a GaAs substrate to constitute a double-hetero junction semiconductor laser element, a first AlGaAs weir layer is grown, on which an AlGaAs active layer is provided, and on this the second AlGaAs weir layer is formed. Then, on this the third AlGaAs weir layer is grown, which is coated with a contact layer. In the constitution, the mixed-crystal ratio of the active layer is specified: 0.02- 0.025, and the mixed-crystal ratio of the first and second weir layers sandwiching the active layer:0.3-0.35. This permits the stress produced in the laser element to be minimized, so that its life is greatly prolonged.
申请公布号 JPS5661189(A) 申请公布日期 1981.05.26
申请号 JP19790138520 申请日期 1979.10.25
申请人 SHARP KK 发明人 TAKENAKA TAKUO;HAYASHI HIROSHI;MURATA KAZUHISA
分类号 H01S5/00 主分类号 H01S5/00
代理机构 代理人
主权项
地址