发明名称 COMPOSITION OF ELECTRODEPOSITION COATING MATERIAL FOR FORMING PHOTORESIST FILM
摘要 PURPOSE:To obtain the compsn. which has excellent storage stability and can form a photoresist film having a high contrast between exposed parts and unexposed parts even after long-term storage by incorporating a spiropyran compd. having a photochromism characteristic into the compsn. CONSTITUTION:The spiropyran compd. having the photochromism characteristic to be used is a piran deriv. having a spiro atom. While any spiropyran compds. which color and decolor by irradiation with active energy rays, the compd. which colors is more preferable in terms of the possession of a more distinct identification ability. The compd. which is colorless or nearly colorless before the irradiation with the active energy rays and discolors to dark blue, purple or reddish purple, etc., after the irradiation to facilitate the identification of the exposed parts and the unexposed parts is more preferable. The more preferable examples of the spiropyran compd. are an indolino spiropyran compd., benzothiazolinospiropyran compd., oxazine spiropyran compd., etc.
申请公布号 JPH04329543(A) 申请公布日期 1992.11.18
申请号 JP19910126633 申请日期 1991.04.30
申请人 TOAGOSEI CHEM IND CO LTD 发明人 TAGUCHI HIROKANE;NIITSUMA HIROSHI;KATO MASARU;NAKAGAWA OSAHIRO
分类号 C09B57/00;C09D5/44;G03C1/685;G03F7/004;G03F7/023;G03F7/027;H01L21/027;H05K3/06 主分类号 C09B57/00
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