| 摘要 |
PURPOSE:To obtain an orientation flat position and improve yield when producing a semiconductor integrated circuit without contacting the outer periphery of a water by measuring the position of a semiconductor outer periphery and that of a stage by using an image line sensor. CONSTITUTION:The position of outer periphery of a wafer 1 which is carried onto an orientation flat stage 3 is determined so that it may enter the visual field of an image linear sensor 24 (CCD). The rotary axis of the orientation flat stage 3 rotates at an equal interval by a stepping motor. The outer- periphery position signal of the wafer in CCD and pulse signal of the stepping motor are synchronized, thus enabling the orientation flat position to be detected roughly. Then, the orientation flat edge is introduced into the visual field of a visual field microscope for pre-alignment 2. The slope of the orientation flat edge within the visual field of the microscope is obtained by image processing on a TV monitor 21, a wafer is rotated slightly by a fine-move rotary table 5, thus performing fine adjustment of the orientation flat position and completing position detection thereof. |
