发明名称 ALIGNMENT DEVIATION MEASURING MARK
摘要 PURPOSE:To make it possible to easily measure alignment deviation by a method wherein two apexes facing with each other are provided on the line in parallel with the boundary line of a plurality of regions, and a square having the four sides of same length is formed. CONSTITUTION:It is designed that alignment deviation measuring marks 31 and 33 are provided on the lines 35a and 36a in parallel with the boundary line 15 of a plurality of regions, and that square-shaped and opposite-angle- passing lines 35a, 35b, 36a and 36b, which pass the opposite angle, can be turned toward X-direction or Y-direction. In order to measure the alignment deviation in X-direction, the line selector of length-measuring SEM is coincided with the lines 35a and 36a, the distance between them is actually measured and the difference between the value of said actual measurement and the design value is computed. Also, pertaining to Y-direction, the line selector of the length- measuring SEM is coincided with the lines 35b and 36b, and the distance between the is actually measured. As a result, the measurement of alignment deviation can be conducted in a simple manner by computing the distance between the lines linking the opposing apexes and by comparing the value of actual measurement and the design value.
申请公布号 JPH02159715(A) 申请公布日期 1990.06.19
申请号 JP19880315682 申请日期 1988.12.14
申请人 SONY CORP 发明人 TSUNAKAWA TOYOHIRO
分类号 G03F9/00;H01L21/027;H01L21/30 主分类号 G03F9/00
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