| 摘要 |
PURPOSE:To obtain a liquid jet recording head particularly suitable and easily applicable for a high-density alignment by a method wherein a heat-accumulation layer is formed on an area over a plurality of thermal energy acting parts on a substrate, and the heat-accumulation layer is provided with a release structure for alleviating a distortion due to heat. CONSTITUTION:In a recording head production process, at least one slit (or round) omission pattern or end cutout omission pattern is formed on a heat- accumulation layer as a release structure for reducing a thermal distortion. On an Si substrate, the heat-accumulation layer (SiO2) 10 is formed, and thereon the patterns as a release structure are provided. Both the slit patterns and the cutout patterns are passed through the heat-accumulation layer down to the Si substrate. If the exposure of the Si in the pattern parts is not preferable in succeeding processes, a thin SiO2 can be formed thereon. As a result, the durability of the heating substrate can be improved. |
