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发明名称
METHOD FOR DIFFUSING IMPURITY INTO SILICON WAFER
摘要
申请公布号
JPH0198223(A)
申请公布日期
1989.04.17
申请号
JP19870256761
申请日期
1987.10.12
申请人
MITSUBISHI METAL CORP;JAPAN SILICON CO LTD
发明人
IWAMOTO KOICHI
分类号
H01L21/225;H01L21/22
主分类号
H01L21/225
代理机构
代理人
主权项
地址
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