发明名称 X-RAY EXPOSURE SYSTEM
摘要 PURPOSE:To transfer a large area with a uniform intensity, by placing a slit continuously controllable from the outside, between a source of a synchrotron radiation ray and an X-ray mirror. CONSTITUTION:A slit 11 is placed between a source 2 of synchrotron radiation ray and a vibrating X-ray mirror 8. The synchrotron radiation ray 3 from the source 2 is projected into the mirror 8, being restricted on its lengthwise beam width. The vibration of the mirror 8 and the movement of the slit 11 is synchronized by controlling the slit driving 13 and the mirror driving 14, based on signals from a controller 12. With compensating a variation of the synchrotron radiation ray caused by an incident angle of the mirror 8 by a width of the slit 11, the synchrotron radiation ray with a specifically uniform intensity is always irradiated to a resist membrane 5, independently from the incident angle of the mirror 8. Thereby a transfer of large area with an uniform intensity is accomplished.
申请公布号 JPS6441900(A) 申请公布日期 1989.02.14
申请号 JP19870196259 申请日期 1987.08.07
申请人 NEC CORP 发明人 FUJII KIYOSHI
分类号 G21K1/04;G21K5/02;H01L21/027;H01L21/30 主分类号 G21K1/04
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