发明名称 APPLICATOR FOR RESIST
摘要 PURPOSE:To use an expensive resist efficiently by dividing a cup into the upper and lower sections and providing an induction pipe so that the resist springing out of a substrate is passed through the intermediate section of the divided cup and can be recovered. CONSTITUTION:The substrate 11 is set onto a susceptor 12 turned by a motor 13 and fixed under vacuum, the resist required for rotary application is fed to the substrate from a nozzle 14, and the substrate is turned at the fixed number of revolution. The resist moves to an end from the center of the substrate by centrifugal force, a resist film in thickness corresponding to revolving torque is formed on the substrate, and other resists spring out of the substrate in approximately horizontal direction, and pass through the induction pipes 17 from the intermediate sections 16 of the cup 15 divided into two upper and lower parts and are recovered to a recovering vessel 18. The induction pipe is coated with Teflon so that the resist is difficult to adhere, and a solvent made contain in the resist is prepared in the recovering vessel so that the recovered resist is not dried and solidified. Accordingly, the recovered resist is washed, viscosity-adjusted and filtered, and can be used for a photo-mask and a wafer again.
申请公布号 JPS5982728(A) 申请公布日期 1984.05.12
申请号 JP19820193205 申请日期 1982.11.02
申请人 NIPPON DENKI KK 发明人 IGARASHI TADANAO
分类号 B05D1/40;B05C11/08;G03F7/16;H01L21/027 主分类号 B05D1/40
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