APPARATUS AND METHOD FOR ALIGNMENT OF MEMBERS TO ELECTRON BEAMS

摘要

Apparatus for exposing precisely located areas of a member to an electron beam wherein the member is precisely located by means of registration indicia thereon which cooperate with an alignment beam of electrons. Suitable control means are provided to be operated by the alignment beam to cause it to coincide with the registration indicia with great precision. The method enables repeated aligning of selected areas of members exactly to a patterned electron beam within a fraction of a micron.