发明名称 SPUTTERING DEVICE FOR MAGNETIC DISK MANUFACTURE
摘要 PURPOSE:To give magnetic anisotropy and to realize film forming with high production efficiency, by providing a film thickness distribution control plate which adjusts the directivity of an oblique particle and film thickness distribution at the boundary of a first film forming area and a second film forming area. CONSTITUTION:A film forming room 12 is divided to two areas, and a side adjacent to a substrate introducing room 10 is set as the first film forming area A, and the side adjacent to a substrate take up room 13 including a pair of targets 11 and 11' as the second film forming area B. And the film distribution control plate 17 which adjusts the directivity of the oblique particle sputtered from the targets 11 and 11' and the film thickness distribution is provided at the boundary of the first film forming area A and the second film forming area B. The film forming of a first layer to attach the magnetic anisotropy is performed by using sputter particle of oblique component generated at the time of film-forming a second layer, and also, it is possible to perform the film forming of the second layer which performs epitaxial growth continuously in a vacuum vessel. In such way, it is possible to easily manufacture a magnetic disk whose recording direction is set as an axis of easy magnetization with high production efficiency.
申请公布号 JPS63121127(A) 申请公布日期 1988.05.25
申请号 JP19860264884 申请日期 1986.11.08
申请人 FUJITSU LTD 发明人 KIUCHI KATSUMI;SAWADA SHIGETOMO;HATA KUNIO;WAKAMATSU HIROAKI;KANDA HIDEKAZU
分类号 G11B5/85;G11B5/851 主分类号 G11B5/85
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