| 摘要 |
A composition of matter is set forth which is useful for removing a photoresist material from a substrate. The composition comprises 10 to 90% by weight of a 2-pyrrolidinone compound of the formula <IMAGE> 10 to 30% by weight of a diethylene glycol monalkyl ether of the formula HOCH2CH2OCH2CH2OR2 1 to 10% by weight of a polyglycol having a molecular weight from about 200 to about 600, and 0.5 to 4% of a quaternary ammonium hydroxide of the formula N+R3R4R5R6 OH- wherein R1 is hydrogen, alkyl of 1 to 3 carbon atoms or hydroxyalkyl of 1 to 3 carbon atoms, R2, R3 and R4 are the same or different alkyl groups of 1 to 4 carbon atoms, R5 is an alkyl group of 1 to 18 carbon atoms, and R6 is an alkyl group of 1 to 18 carbon atoms, phenyl, alkylphenyl wherein the alkyl is of 1 to 18 carbon atoms, benzyl, or alkylbenzyl wherein the alkyl is of 1 to 18 carbon atoms.
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