发明名称 HIGH PURITY GAS MAINTAINING VESSEL
摘要 PURPOSE:To provide a cylinder which is decreased in a gas adsorption amount, by a method wherein a very smooth passivated film is formed on the inner surface of the cylinder by an electrolytic composite polishing method. CONSTITUTION:The cathode side and the anode side of a d.c. or impulsive voltage are connected to a cathode 2 of a tool 1 and a metal to be polished, respectively. In polishing processing, electrolyte 5 is fed and the cathode 2 is rotated in a state to be pressed against the metal to be polished, a passive oxidation film formed in the uneven surface of the surface of the metal to be polished, and the projected part of the film is abraded for removal by means of polishing grains 6 to electrolytically elute the projected part of the metal to be polished in priority and selectively for polishing. This constitution enables provision of a cylinder which is decreased in a gas adsorption amount.
申请公布号 JPS6319499(A) 申请公布日期 1988.01.27
申请号 JP19860158716 申请日期 1986.07.08
申请人 SHOWA DENKO KK;HITACHI ZOSEN CORP;OMI TADAHIRO 发明人 OMI TADAHIRO;MURAYAMA TAKAHIRO;MIURA TOSHIAKI;BABA YOSHIYASU;CHIBA SEIGO
分类号 F17C1/00;F17C1/10;(IPC1-7):F17C1/10 主分类号 F17C1/00
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