发明名称 METHOD OF INSPECTING SEMICONDUCTOR WAFER
摘要 PURPOSE:To set the correct crystallographic axis direction of a semiconductor wafer by anisotropically etching plural rectangles which have each different angle side against an orientation flat and by providing an indication line which shows the crystallographic axis direction along the direction of the side which has suitable linearity. CONSTITUTION:Square regions 11 and 16 have a side which is in parallel with an orientation flat 2, square regions 12 and 17, 13 and 18, 14 and 19, 15 and 20 have a side which shifts to a different direction respectively and these square regions 11-20 are anisotropically etched with an alkaline etching liquid. Among the sides of the etched square regions 11-20, a side which is in parallel with an actual crystallographic axis has excellent linearity and the other sides are rugged like saw teeth. For example, a crystallographic axis direction is set in parallel with the side of the square region 14 and an indication line 30 is formed to make the direction clear. Then, a semiconductor device is manufactured on a semiconductor wafer 1 on the basis of the set crystallographic axis.
申请公布号 JPS62179713(A) 申请公布日期 1987.08.06
申请号 JP19860021571 申请日期 1986.02.03
申请人 SANYO ELECTRIC CO LTD 发明人 SHIBATA KATSUHIRO
分类号 H01L21/66;H01L21/02 主分类号 H01L21/66
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