INLINE TYPE THIN FILM FORMING DEVICE

摘要

PURPOSE:To provide a titled device which decreases a loss time by cleaning and to improves throughput by providing successively and adjacently a substrate charging chamber, a deposition chamber for forming a thin film on a substrate and a substrate taking out chamber. CONSTITUTION:This inline type thin film forming device is constituted by providing successively and adjacently the substrate charging chamber 1, the deposition chamber 2 provided with a sputtering electrode 7 carrying a target 6 which is a vapor deposition source for depositing the thin film on the substrate and the substrate taking out chamber 3. An antisticking plate 8 to be disposed in the chamber 2 so as to cover the target 6, etc. of the above-mentioned device is provided conveyably by a suitable conveying means to the chambers 1-3. The clean plate 8 is carried from the chamber 1 through a valve 4 into the chamber 2 to prevent the sticking of the material for deposition on the wall surface. The plate 8 is taken out through the chamber 3 in the stage of cleaning the plate so that the loss time by the cleaning is decreased.