| 摘要 |
PURPOSE:To make possible the formation of a pattern even if an amorphous magnetic alloy film is thick by heating the unnecessary amorphous magnetic alloy film except the magnetic path pattern to crystallize said film and removing chemically only the crystallized part by an etching soln. CONSTITUTION:The amorphous magnetic alloy film is formed by sputtering to 20mum thickness on a substrate 1 and the unnecessary part except the return magnetic path pattern shown by a broken line is heated and crystallized by scanning said part with a laser beam 3. Said part is then etched by nitric acid to remove the crystallized part, thus forming the return magnetic path 4. An insulating layer 5, a thin film coil 6, an insulating layer 7 and a main magnetic path 8 are successively formed, by which a thin film magnetic head is obtd. |
