发明名称 DUO PLASMATRON TYPE ION SOURCE
摘要 PURPOSE:To extract ion types other than gas component by using solid phase components as the ion source material and melting them and then supply them to discharge space. CONSTITUTION:A cathode 21 has a recess 14 that contains ion source material 12 and is comprised with a housing 15 in which a support section made of porous material such as porous tungusten is installed so that the melted ion source material 12 can be supplied to the space between an intermediate electrode 12 and the cathode 21. When the lower end of the housing 15 is exposed to plasma 9, the support section 11 reaches high temperatures. As a result, the ion source material 12 is melted, penetrated into the support section 11, evaporated, and the plasma 9 is formed as a part of discharge gas. At this state, ion extraction voltage is applied and an ion beam 10 is extracted using the ion source material 12.
申请公布号 JPS59167944(A) 申请公布日期 1984.09.21
申请号 JP19840042034 申请日期 1984.03.07
申请人 HITACHI SEISAKUSHO KK 发明人 TAMURA HIFUMI;ISHITANI TOORU
分类号 H01J27/10;H01J37/08;(IPC1-7):H01J37/08 主分类号 H01J27/10
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