发明名称 X-RAY SOURCE APPARATUS
摘要 PURPOSE:To acquire sufficient amount of X-ray to an object to be irradiated by irradiating a target with electron beams from two or more electron guns and by integrally providing two or more X-ray sources. CONSTITUTION:An X-ray tube 1 is provided with two or more electron guns such as electron guns 2, 3, etc., one water-cooled copper target 4 and Be X-ray windows 5, 6. The target 4 is irradiated with the electron beams from the electron guns 2, 3, forming two or more X-ray sources. The X-rays 7, 8 from two or more X-ray sources transfer a figure of X-ray mask 9 to the resist 11 on the Si wafer 10 through the X-ray mask.
申请公布号 JPS59144129(A) 申请公布日期 1984.08.18
申请号 JP19830019254 申请日期 1983.02.08
申请人 SUWA SEIKOSHA KK 发明人 IWAMATSU SEIICHI
分类号 G01N23/00;G03F7/20;H01J35/08;H01L21/027 主分类号 G01N23/00
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