| 摘要 |
PURPOSE:To obtain a vertically magnetized film which is satisfactory even if the film is light-gaged and has bending rigidity smaller than that of a Co-Cr alloy film without using a Co-Cr or Co-V alloy material by making Co vapor incident perpendicularly to a nonmagnetic substrate and subjecting the same to vacuum deposition in an atmosphere contg. a trace of oxygen. CONSTITUTION:Co is deposited by evaporation on a glass substrate which is optically polished, by using a resistance heating type vapor deposition device. 1 is a glass substrate, 2 is a vapor deposition source, 3 is a needle valve and 4 is a heater for heating the substrate. The vertically magnetized film consisting essentially of Co is obtd. By making Co vapor flow incident perpendicularly to the substrate, depositing the same by evaporation on the substrate in a vacuum atmosphere kept under the oxygen partial pressure ranging 4.4X10<-5>-6.5X 10<-5> Torr to maintain the average oxygen content in the film deposited by evaporation in a 30-40 atom% range, and controlling the satd. magnetic flux density of the resulting Co film deposited by evaporation so as to attain a range of <=6,500G, more preferably 6,500-3,500G. The substrate temp. in the stage of the vapor deposition is kept at <=130 deg.C and the thickness of the Co film deposited by evaporation is kept at >=0.05mum. |
