| 摘要 |
PURPOSE:To correct a defective mask, by using masks where a prescribed pattern and a pattern, which is obtained by mirror conversion of this pattern, are formed on glass plates individually and arranging both masks so that respective patterns face to each other and transferring them. CONSTITUTION:In case that a mask 7 which has a Cr pattern 3 having a pinhole 3 or the like is corrected, a Cr mask 8 is produced where a Cr pattern 1' having a shape obtained by mirror conversion of the Cr pattern 1 of this mask 7 is formed on a glass plate 2'. Masks 7 and 8 are so arranged that surfaces of both Cr patterns 1 and 1' face to each other closely or at a proper interval, and patterns are transfered. Thus, there is a very little probability that a defect 3' is formed in the same position as the defect 3 of the pattern 1 on the Cr pattern 1'. Consequently, defects of patterns 1 and 1' are compensated and hidden by each other to make an accurate transfer possible. |
