发明名称 Method of making semiconductor device having improved Schottky-barrier junction
摘要 A semiconductor device having an improved non-diffusive Schottky-barrier junction and metallization layers and method for producing the same. A thin layer of a Schottky-barrier forming metal such as platinum is sputter deposited upon a hot gallium arsenide substrate, thereby impact alloying a portion of the Schottky-barrier forming metal with the gallium arsenide material. A refractive metal such as titanium is then sputtered above the Schottky-barrier forming layer at a power level sufficient to alloy the remaining Schottky-barrier forming metal with the refractive metal. A highly conductive layer such as gold is then sputter deposited over the refractive layer to provide ohmic contact. The invention may be used to particular advantage in microwave diode and field effect transistor devices.
申请公布号 US4374012(A) 申请公布日期 1983.02.15
申请号 US19810275081 申请日期 1981.06.18
申请人 RAYTHEON COMPANY 发明人 ADLERSTEIN, MICHAEL G.
分类号 H01L21/285;H01L21/329;H01L29/47;H01L29/812;H01L29/864;(IPC1-7):C23C15/00 主分类号 H01L21/285
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