发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To prevent in advance an accident caused by a photoresist during the step of manufacturing semiconductor by removing the photoresist introduced from the outer edge of a semiconductor substrate to the inside in the prescribed width. CONSTITUTION:A light shielding plate 3 for preventing the exposure of a light source lamp 1 in the width of 1-5mm. from the outer edge of the main surface of a semiconductor substrate 7 is mounted at the adequate position in the exposure device used by a photoetching method, and a photoresist 6 is removed. In this manner, an accident of disturbing the free drop of the photoresist due to its adhesive or adhering to the main surface of a semiconductor substrate can be prevented in the step of isolating and scattering the photoresist pattern in the vicinity of the end of the substrate.
申请公布号 JPS57100730(A) 申请公布日期 1982.06.23
申请号 JP19800177918 申请日期 1980.12.16
申请人 NIPPON DENKI KK 发明人 KURODA YOSHIO
分类号 H01L21/027;G03F7/20;(IPC1-7):01L21/30 主分类号 H01L21/027
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