发明名称 Structure of the insulator-semiconductor type
摘要 Structure of the insulator-semiconductor type constituted by a semiconducting crystalline substrate formed from a III-V compound of formula (AIIIBV) coated with an insulating layer, wherein the substrate has a specific crystalline orientation and wherein the insulator is a sulphide in accordance with the formula (AIIIBV)S4. It also relates to a process for the preparation of such a structure. Applications of the invention occur in the fields of microelectronics and optoelectronics.
申请公布号 US4320178(A) 申请公布日期 1982.03.16
申请号 US19800136568 申请日期 1980.04.02
申请人 CHEMLA, DANIEL;COT, LOUIS;JERPHAGNON, JEAN;DURAND, JEAN 发明人 CHEMLA, DANIEL;COT, LOUIS;JERPHAGNON, JEAN;DURAND, JEAN
分类号 H01S5/00;H01L21/314;H01L29/51;H01L29/94;(IPC1-7):H01L21/18 主分类号 H01S5/00
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