Structure of the insulator-semiconductor type constituted by a semiconducting crystalline substrate formed from a III-V compound of formula (AIIIBV) coated with an insulating layer, wherein the substrate has a specific crystalline orientation and wherein the insulator is a sulphide in accordance with the formula (AIIIBV)S4. It also relates to a process for the preparation of such a structure. Applications of the invention occur in the fields of microelectronics and optoelectronics.
申请公布号
US4320178(A)
申请公布日期
1982.03.16
申请号
US19800136568
申请日期
1980.04.02
申请人
CHEMLA, DANIEL;COT, LOUIS;JERPHAGNON, JEAN;DURAND, JEAN
发明人
CHEMLA, DANIEL;COT, LOUIS;JERPHAGNON, JEAN;DURAND, JEAN