STEP-AND-REPEAT PROJECTION AND ALIGNMENT EXPOSURE SYSTEM¹(USED IN PRODUCTION OF INTEGRATED CIRCUIT),申请号IE19800000663-传众专利搜索

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发明名称	STEP-AND-REPEAT PROJECTION AND ALIGNMENT EXPOSURE SYSTEM¹(USED IN PRODUCTION OF INTEGRATED CIRCUIT)
摘要
申请公布号	IE800663(L)	申请公布日期	1980.10.03
申请号	IE19800000663	申请日期	1980.04.01
申请人	EATON CORPORATION (S.22)	发明人
分类号	G03B41/00;(IPC1-7):G03B41/00	主分类号	G03B41/00
代理机构		代理人
主权项
地址

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