发明名称 PROCESS FOR THE DEVELOPMENT OF EXPOSED LIGHT-SENSITIVE PRINTING PLATES BASED ON O-NAPHTHOQUINONE-DIAZIDES
摘要 1. Process for the development of exposed light-sensitive printing plates having a support of anodically oxidized aluminum and a light-sensitive coating which contains an o-naphthoquinone-diazide and an alkali-soluble resin, the exposed areas of the coating being washed off with an aqueous-alkaline developer solution, characterized in that, the development is effected in the presence of an ionizable compound of an element of the groups IIa, IIIa or IIIb of the Periodic Table, which is added to the developer solution, and wherein the developer solution used contains 0.001 to 0.5 % by weight of the ionizable compound.
申请公布号 ZA7904131(B) 申请公布日期 1980.08.27
申请号 ZA19790004131 申请日期 1979.08.08
申请人 HOECHST AG 发明人 HACKMANN E;BERGHAEUSER G;STAHLHOFEN P
分类号 G03F7/022;B41N1/08;G03F7/30;G03F7/32 主分类号 G03F7/022
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