发明名称 Inert atmosphere chamber
摘要 An inert gas chamber for use in continuously curing oxygen sensitive coating compositions by the application of radiation, employs a jet of inert gas to displace the air boundary layer on the coated substrate as the coated substrate moves into the chamber. The coated substrate is also blanketed with inert gas and subjected to the radiation. The use of inert gas to cool the window of the electron beam accelerator may be used in the chamber, thus avoiding ozone-based pollution.
申请公布号 US4143468(A) 申请公布日期 1979.03.13
申请号 US19750569589 申请日期 1975.04.18
申请人 NOVOTNY, JEROME L.;NICKERSON, SR., ROY S. 发明人 NOVOTNY, JEROME L.;NICKERSON, SR., ROY S.
分类号 B05D3/06;F26B3/28;F26B3/34;F26B21/14;(IPC1-7):F26B3/34 主分类号 B05D3/06
代理机构 代理人
主权项
地址
您可能感兴趣的专利