发明名称 Transmission heat-development photosensitive material
摘要 <p>A transmission heat-development photosensitive material having an exposure wavelength of 750 nm or shorter, having a structure that an adsorbance of the material with respect to an exposing wavelength before an exposure and development process is 0.5 or smaller and a highest density of 2.8 can be realized with energy which is not larger than 7 times (in a case of a negative-type material) exposing energy required to realize a density of 1.2 or not smaller than 1/7 (in a case of a positive-type material) of the exposing energy.</p>
申请公布号 EP0984323(A2) 申请公布日期 2000.03.08
申请号 EP19990115778 申请日期 1999.08.10
申请人 FUJI PHOTO FILM CO., LTD. 发明人 SOJI, TAKASHI
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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