发明名称 |
Transmission heat-development photosensitive material |
摘要 |
<p>A transmission heat-development photosensitive material having an exposure wavelength of 750 nm or shorter, having a structure that an adsorbance of the material with respect to an exposing wavelength before an exposure and development process is 0.5 or smaller and a highest density of 2.8 can be realized with energy which is not larger than 7 times (in a case of a negative-type material) exposing energy required to realize a density of 1.2 or not smaller than 1/7 (in a case of a positive-type material) of the exposing energy.</p> |
申请公布号 |
EP0984323(A2) |
申请公布日期 |
2000.03.08 |
申请号 |
EP19990115778 |
申请日期 |
1999.08.10 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SOJI, TAKASHI |
分类号 |
G03C1/498;(IPC1-7):G03C1/498 |
主分类号 |
G03C1/498 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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