发明名称 Production of finely structured layer on substrate - applying intermediate layer with solubility varying as function of depth for selective dissolution
摘要 <p>An auxiliary layer (2) of a soluble material is applied on the substrate, and removed in separate zones in accordance with the structure. A second layer is applied on the auxiliary layer and bared zones of the substrate, and the auxiliary layer dissolved, with parts of the second layer on the auxiliary layer also removed. The auxiliary layer is made of a material whose solubility at or near the surface (3) is lower than in deeper parts of it.</p>
申请公布号 DE2636351(A1) 申请公布日期 1978.02.16
申请号 DE19762636351 申请日期 1976.08.12
申请人 SIEMENS AG 发明人 SIGUSCH,REINER,ING.
分类号 G03F7/16;H01L21/027;H01L21/285;(IPC1-7):01L21/30;01B5/14 主分类号 G03F7/16
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