| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition suitable for excimer laser lithography and ensuring well-balanced high sensitivity and good resist shape. <P>SOLUTION: The chemically amplified positive resist composition comprises a resin which has a polymerized unit having an acid-unstable group and is insoluble or slightly soluble itself in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid, and a sulfonium salt, wherein the polymerized unit having an acid-unstable group is at least one selected from the group comprising the polymerized units represented by formula (Ia) and the polymerized units represented by formula (Ib), and the solfonium salt is a sulfonium salt represented by formula (II). In the formula (Ia) and (Ib), R<SP>1</SP>is methyl or H and R<SP>2</SP>-R<SP>4</SP>are each a 1-6C alkyl. In the formula (II), Q<SP>1</SP>-Q<SP>12</SP>are each H, hydroxyl, a 1-6C alkyl or a 1-6C alkoxy and X<SP>-</SP>is a counter ion. <P>COPYRIGHT: (C)2004,JPO |
