发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
摘要 In one embodiment a semiconductor device includes odd contacts and respective odd lines. Spacers are formed on sidewalls of the odd lines and even openings for even lines are formed by performing an etching process. Even contacts are formed in the even openings and then even lines are formed.
申请公布号 US2008096377(A1) 申请公布日期 2008.04.24
申请号 US20070623269 申请日期 2007.01.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWAK DONG-HWA;PARK JAE-KWAN;SIM JAE-HWANG;KIM JIN-HO;KIM KI-NAM
分类号 H01L21/44 主分类号 H01L21/44
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