| 摘要 |
PROBLEM TO BE SOLVED: To obtain sufficient resolution, sensitivity and aspect ratio of the photosensitive resin composition by incorporating an acid-decomposable substance having a urea group or aminopyrazine group or a radiation-sensitive substance, which prevent the dissolution of a polymer having carboxyl groups in an alkaline developing solution. SOLUTION: The photosensitive resin composition contains the polymer having an alicyclic structure and carboxylic groups, a substance to be allowed to release an acid by radiation and a substance represented by formula I or/and a substance represented by formula II, and in formulae I and II, A1 is an atom of group VI of the periodic table; each of R1 and R2 is a 3-50C organic group and at least one of them is a hydroxyl group to be deprotected with an acid or/and a carboxyl group; A2 is an O, S, or N atom; and each of R3 and R4 is a 3-40C organic group and at least one of them is a hydroxyl group to be deprotected with an acid; or/and a carboxyl group. This makes the obtained pattern forming method superior in resolution performance and free from swelling. |
