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发明名称
POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号
KR20070046290(A)
申请公布日期
2007.05.03
申请号
KR20050102805
申请日期
2005.10.31
申请人
DONGJIN SEMICHEM CO., LTD.
发明人
LEE, JUNG YOUL;OH, SEUNG KEUN;LEE, JAE WOO;KIM, JAE HYUN
分类号
G03F7/039;G03F7/021;G03F7/027
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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