发明名称 SOURCE PATCH DETERMINING METHOD FOR RECONSTRUCTING TARGET PATCH AND EXEMPLAR BASED IMAGE INPAINTING
摘要 Provided is a technique for searching for a source patch for high-quality image inpainting. Furthermore, provided is a method for image inpainting. A source patch determination method for reconstructing a target patch comprises the steps of: determining, by an image processing device, a target patch, required to be reconstructed, based on priorities of pixels located in a boundary region of a reconstruction region in an image including a source region and the reconstruction region required to be reconstructed; calculating, by the image processing device, mean-squared error distortion (MSE distortion) values and side matching distortion (SMD) values between the target patch and candidate source patches in the source region; and determining, by the image processing device, a final source patch for reconstruction of the target patch among the candidate source patches based on values obtained by adding the mean-squared error distortion values and the side matching distortion values.
申请公布号 KR20160074275(A) 申请公布日期 2016.06.28
申请号 KR20140183395 申请日期 2014.12.18
申请人 KONKUK UNIVERSITY INDUSTRIAL COOPERATION CORP. 发明人 YIM, CHANG HOON;CHUNG, BYUNG JIN
分类号 G06T11/40;G06T7/40 主分类号 G06T11/40
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