发明名称 |
METHOD FOR FORMING MICROLENSES WITH HIGH LIGHT TRANSMITTANCE IN IMAGE SENSOR |
摘要 |
There is provided a method for forming microlenses in an image sensor having high light transmittance in short wavelength regions of visible lights, the method comprising: depositing a resist film for microlens over a predetermined substrate; selectively first-exposing the resist film to light in a range of exposure wavelengths and developing it to form resist patterns; second-exposing the remaining resist patterns to light photochemically to decompose an active form of sensitisizer remained in the resist patterns into an inactive form; and heating and flowing the resist patterns to form microlenses.
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申请公布号 |
US2001044166(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
US19990475011 |
申请日期 |
1999.12.30 |
申请人 |
PARK KI-YEOP;BAE SANG-GIL |
发明人 |
PARK KI-YEOP;BAE SANG-GIL |
分类号 |
H01L27/146;H01L31/0232;(IPC1-7):H01L21/00 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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