发明名称 |
Wafer with improved plating current distribution |
摘要 |
A semiconductor wafer is provided including a plurality of dies, each of the plurality of dies including a plurality of semiconductor devices, a plurality of die seals, each of the plurality of die seals being formed at a perimeter of one of the plurality of dies, and a plurality of electrically conductive links, each of the plurality of conductive links connecting one of the plurality of die seals with another one of the plurality of die seals. |
申请公布号 |
US9349641(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201414487250 |
申请日期 |
2014.09.16 |
申请人 |
GLOBALFOUNDRIES Inc. |
发明人 |
Werner Thomas;Aubel Oliver;Feustel Frank |
分类号 |
H01L21/44;H01L21/768;H01L27/02;H01L23/528;H01L21/56 |
主分类号 |
H01L21/44 |
代理机构 |
Amerson Law Firm, PLLC |
代理人 |
Amerson Law Firm, PLLC |
主权项 |
1. A method of manufacture of a semiconductor wafer, comprising the steps of:
forming a first integrated circuit on a first die of said semiconductor wafer and forming a second integrated circuit on a second die of said semiconductor wafer; forming a first die seal on said semiconductor wafer at the perimeter of said first die and a second die seal on said semiconductor wafer at the perimeter of said second die; and forming an electrically conductive link between said first and the second die seals. |
地址 |
Grand Cayman KY |