发明名称 Wafer with improved plating current distribution
摘要 A semiconductor wafer is provided including a plurality of dies, each of the plurality of dies including a plurality of semiconductor devices, a plurality of die seals, each of the plurality of die seals being formed at a perimeter of one of the plurality of dies, and a plurality of electrically conductive links, each of the plurality of conductive links connecting one of the plurality of die seals with another one of the plurality of die seals.
申请公布号 US9349641(B2) 申请公布日期 2016.05.24
申请号 US201414487250 申请日期 2014.09.16
申请人 GLOBALFOUNDRIES Inc. 发明人 Werner Thomas;Aubel Oliver;Feustel Frank
分类号 H01L21/44;H01L21/768;H01L27/02;H01L23/528;H01L21/56 主分类号 H01L21/44
代理机构 Amerson Law Firm, PLLC 代理人 Amerson Law Firm, PLLC
主权项 1. A method of manufacture of a semiconductor wafer, comprising the steps of: forming a first integrated circuit on a first die of said semiconductor wafer and forming a second integrated circuit on a second die of said semiconductor wafer; forming a first die seal on said semiconductor wafer at the perimeter of said first die and a second die seal on said semiconductor wafer at the perimeter of said second die; and forming an electrically conductive link between said first and the second die seals.
地址 Grand Cayman KY