发明名称 METAL LINE OF SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A metal line includes a lower metal line pattern having a first width formed over the dielectric pattern and an upper metal line pattern formed over and contacting the lower metal line pattern such that the upper metal line pattern has a second width less than the first width.
申请公布号 US2009152726(A1) 申请公布日期 2009.06.18
申请号 US20080330622 申请日期 2008.12.09
申请人 CHOI KWANG-SEON 发明人 CHOI KWANG-SEON
分类号 H01L21/469;H01L23/48 主分类号 H01L21/469
代理机构 代理人
主权项
地址