| 摘要 |
The purpose of the present invention is to provide a photoresist remover liquid which has excellent resist removal ability, and with which formation of deposits on metal surfaces during the resist removal step can be minimized. This photoresist remover liquid contains dimethyl sulfoxide, a quaternary ammonium hydroxide, an amine, water, and an amino acid, the photoresist remover liquid being characterized in that the water content is 30 wt% or less, and the amino acid is at least one selected from the group consisting of alanine, threonine, cysteine, and proline. |
