ELECTRON BEAM LITHOGRAPHIC SYSTEM,申请号JP19860197180-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	ELECTRON BEAM LITHOGRAPHIC SYSTEM
摘要
申请公布号	JPS6354723(A)	申请公布日期	1988.03.09
申请号	JP19860197180	申请日期	1986.08.25
申请人	HITACHI LTD;HITACHI VLSI ENG CORP	发明人	HAYAKAWA HAJIME;MIZUNO FUMIO;AONO TAKESHI
分类号	H01L21/027;H01L21/30	主分类号	H01L21/027
代理机构		代理人
主权项
地址

您可能感兴趣的专利

LIGHT EMITTING ELEMENT, LIGHT EMITTING PACKAGE, AND LIGHTING SYSTEM

GROUP III NITRIDE COMPOUND SEMICONDUCTOR ELEMENT, AND METHOD OF MANUFACTURING THE SAME

COMMODITY RENTAL MANAGEMENT SERVER DEVICE, COMMODITY RENTAL MANAGEMENT METHOD AND PROGRAM FOR THE COMMODITY RENTAL MANAGEMENT SERVER DEVICE

REACTOR, CHEMICAL VAPOR DEPOSITION REACTOR, AND ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION REACTOR

EPITAXIAL FILM AND LIGHT-EMITTING ELEMENT

HEAT PUMP WATER HEATER

MOTOR DRIVE CIRCUIT

PIEZOELECTRIC VIBRATION DEVICE

METHOD FOR PLANARIZING UNEVENNESS OF SEABED

AMPLIFICATION OF HIV-1 SEQUENCE FOR DETECTING SEQUENCE RELATED TO DRUG-RESISTANT MUTATION

MEASURING INSTRUMENT COMPRISING BIOSENSOR

BINDING DOMAIN IN NOTCH AND DELTA PROTEINS

CATALYST CARRIER FOR PURIFYING EXHAUST GAS AND CATALYST FOR PURIFYING EXHAUST GAS USING THE CATALYST CARRIER

STEREOSCOPIC IMAGING APPARATUS

Method for Measuring Performance Metrics of a Wireless Device

Managing spectra of modulated signals in a communication network

Cable pusher guiding system, method and device

Matboard slip frame

Apoptosis-inducing agents for the treatment of cancer and immune and autoimmune diseases