发明名称 Insulated gate bipolar transistor having high breakdown voltage
摘要 An insulated gate bipolar transistor having a low on-voltage and a low turn-off time is provided. P-type anode layer having a low impurity concentration, preferably 1x1016 to 1x101 7/cm3, is provided on an N-type drain layer that includes a pair of P-type base regions each having an N+-type source region. A plurality of P+-type anode regions are formed in the P-type anode layer.
申请公布号 US5331184(A) 申请公布日期 1994.07.19
申请号 US19920928066 申请日期 1992.08.11
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KUWAHARA, MASASHI
分类号 H01L29/78;H01L29/08;H01L29/739;(IPC1-7):H01L29/74;H01L31/111;H01L29/76;H01L23/58 主分类号 H01L29/78
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