发明名称 ARRAY SUBSTRATE AND METHOD OF MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide an array substrate capable of increasing effective area of auxiliary capacitance while the aperture ratio is maintained and to provide its manufacturing method. SOLUTION: The array substrate provided with switching elements disposed in the vicinity of intersection points of signal lines and scanning lines which are disposed on an insulating substrate in a matrix shape, pixel electrodes disposed corresponding to regions enclosed by the signal lines and the scanning lines and the auxiliary capacitance electrically connected with the pixel electrodes is characterized in that the auxiliary capacitance is constituted of a semiconductor or a metal layer, an insulating film and an electrode and the surface of the semiconductor or the metal layer has a rugged structure.</p>
申请公布号 JP2001337348(A) 申请公布日期 2001.12.07
申请号 JP20000159598 申请日期 2000.05.30
申请人 TOSHIBA CORP 发明人 KENMOCHI MASAHITO
分类号 G02F1/136;G02F1/1368;G09F9/00;G09F9/30;H01L21/336;H01L29/786;(IPC1-7):G02F1/136 主分类号 G02F1/136
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