COMPOSITIONS FOR REMOVING PHOTORESIST AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME,申请号KR20150059184-传众专利搜索

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发明名称	COMPOSITIONS FOR REMOVING PHOTORESIST AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
摘要	포토레지스트 제거용 조성물은 불화알킬암모늄 염 0.5 중량% 내지 10 중량%, 유기 술폰산 1 중량% 내지 20 중량%, 및 락톤계 용매 70 중량% 내지 98.5 중량%를 포함한다.
申请公布号	KR20160127582(A)	申请公布日期	2016.11.04
申请号	KR20150059184	申请日期	2015.04.27
申请人	SAMSUNG ELECTRONICS CO., LTD.;DONGWOO FINE-CHEM CO., LTD.	发明人	OH, JUNG MIN;PARK, MI HYUN;LEE, HYO SAN;JEONG, JI HOON;KO, YONG SUN;KIM, IN GI;KIM, NA RIM;KIM, SANG TAE;KIM, SEONG MIN;LEE, KYONG HO
分类号	G03F7/42	主分类号	G03F7/42
代理机构		代理人
主权项
地址

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