SEMICONDUCTOR SUBSTRATE AND MANUFACTURE THEREOF,申请号JP19900183919-传众专利搜索

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发明名称	SEMICONDUCTOR SUBSTRATE AND MANUFACTURE THEREOF
摘要
申请公布号	JPH0472631(A)	申请公布日期	1992.03.06
申请号	JP19900183919	申请日期	1990.07.13
申请人	HITACHI LTD	发明人	KATO TERUO
分类号	H01L21/02;H01L21/322;H01L27/12	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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