| 发明名称 |
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST |
| 摘要 |
Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):; |
| 申请公布号 |
US2017123319(A1) |
申请公布日期 |
2017.05.04 |
| 申请号 |
US201615337558 |
申请日期 |
2016.10.28 |
| 申请人 |
Rohm and Haas Electronic Materials Korea Ltd. |
发明人 |
Ryu Eui-Hyun;Park Jin Hong;Shin You Rim;Kang Ji-Hon;Lee Jung-June;Lim Jae-Bong |
| 分类号 |
G03F7/11;C09D5/00;C08G73/06;G03F7/20;G03F7/32;C09D179/04;G03F7/16 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming a photoresist relief image, comprising:
a) applying on a substrate a layer of a coating composition comprising a resin that comprises one or more glycoluril groups that have a non-hydrogen substituent at the 1 and/or 5 glycoluril ring positions; and b) applying a layer of a photoresist composition above the coating composition layer. |
| 地址 |
Cheonan KR |
