SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY

摘要

The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.

主权项

1. A lithography apparatus, comprising:
a radiation source configured to produce radiation; a first unit column assembly (UCA) that includes a first row of exposure columns packed in a first direction; and a second unit column assembly (UCA) disposed adjacent to the first UCA in a second direction, the second direction being different from the first direction, wherein the second UCA includes a second row of exposure columns packed in the first direction, and wherein the second row of exposure columns is shifted in the first direction with respect to the first row of exposure columns.