| 发明名称 |
VISION-BASED WAFER NOTCH POSITION MEASUREMENT |
| 摘要 |
A wafer alignment system includes an image capture device that captures an image of a wafer positioned on a pedestal. An image analysis module analyzes the image to detect an edge of the wafer and a notch formed in the edge of the wafer and calculates, based on a position of the notch, first and second edge positions corresponding to the edge of the wafer. An offset calculation module that calculates an angular offset of the wafer based on the first position and the second edge positions. A system control module controls transfer of the wafer from the pedestal to a process cell based on the angular offset. |
| 申请公布号 |
US2017032510(A1) |
申请公布日期 |
2017.02.02 |
| 申请号 |
US201514813948 |
申请日期 |
2015.07.30 |
| 申请人 |
Lam Research Corporation |
发明人 |
Francken Gustavo G.;Senn Brandon;Thaulad Peter;Chen Zhuozhi;Lyons Richard K.;DiPietro Christian;Bartlett Christopher M. |
| 分类号 |
G06T7/00;H01L21/68 |
主分类号 |
G06T7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A wafer alignment system comprising:
an image capture device that captures an image of a wafer positioned on a pedestal; an image analysis module that analyzes the image to detect an edge of the wafer and a notch formed in the edge of the wafer, and that calculates, based on a position of the notch, first and second edge positions corresponding to the edge of the wafer; an offset calculation module that calculates an angular offset of the wafer based on the first edge position and the second edge position; and a system control module that controls transfer of the wafer from the pedestal to a process cell based on the angular offset. |
| 地址 |
Fremont CA US |
