COMPOSITION FOR RUGGED STRUCTURE FORMATION

摘要

PROBLEM TO BE SOLVED: To provide a composition capable of forming a rugged structure without the needs of: the employment of conventional methods for forming rugged structures such as etching, photo-lithography, and nanoimprinting; and operations such as applying stress to a base material or extending it.SOLUTION: A composition for rugged structure formation is liquid under vacuum, and includes a polymerizable compound.SELECTED DRAWING: Figure 1