发明名称 FILM COMPRISING COPOLYMER OR COMPOSITION
摘要 Provided are a film in which the balance between hydrophilicity and abrasion resistance is superior, decrease in hydrophilicity by water is minimal, and the weather resistance is also superior; as well as a polymer and a polymer composition that can yield such a film. The film of the invention is prepared from a specific copolymer (i) having a sulfonic acid-containing group, an epoxy group, and a specific alkoxysilyl group in a molecule, or from a composition including the copolymer (i).
申请公布号 US2016046827(A1) 申请公布日期 2016.02.18
申请号 US201414779902 申请日期 2014.04.07
申请人 MITSUI CHEMICALS, INC. 发明人 OKAZAKI Koju;HANAWA Takayuki;KUMA Shigetoshi
分类号 C09D133/26 主分类号 C09D133/26
代理机构 代理人
主权项 1. A film which is obtained from a copolymer (i) comprising constitutional units expressed by the following general formulas (1), (2), and (3), or from a composition comprising the copolymer (i), and which has a thickness of not more than 100 nm, wherein in the formulas (1), (2) and (3), each of a, b, and c represents the constitutional ratio of each constitutional unit, satisfying a=0.998 to 0.001, b=0.001 to 0.998, c=0.001 to 0.998, and a+b+c=1; A1 is a single bond, a C1 to C10 divalent hydrocarbon group, a group expressed by the following formula (1-1), or a group expressed by the following formula (1-2); A2 is a single bond, a C1 to C10 divalent hydrocarbon group, a group expressed by the following formula (2-1), or a group expressed by the following formula (2-2); A3 is a single bond, a C1 to C10 divalent hydrocarbon group, a group expressed by the following formula (3-1), or a group expressed by the following formula (3-2); R1, R2 and R3 independently represent a hydrogen atom, or a methyl group; R4 independently represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a butyl group; R10 represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, a methoxy group, an ethoxy group, a propoxy group, or a butoxy group; and M represents a hydrogen atom, an alkali metal ion, a semi-valent alkaline earth metal ion, an ammonium ion, or an amine ion; and wherein in the formulas (1-1), (1-2), (2-1), (2-2), (3-1), and (3-2), n and n2 independently are an integer from 1 to 10; n1 is an integer from 0 to 10; m is an integer from 1 to 6; m1 is an integer from 0 to 6; 1 is an integer from 0 to 4; R5 and R6 independently represent a hydrogen atom, or a methyl group; * represents an end bonding to SO3M; ** represents an end bonding to an epoxy group; and *** represents an end bonding to a Si atom.
地址 Tokyo JP